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Nanofriction of silicon oxide surfaces covered with thin water films

✍ Scribed by A Opitz; S.I.-U Ahmed; J.A Schaefer; M Scherge

Book ID
108390860
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
224 KB
Volume
254
Category
Article
ISSN
0043-1648

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✍ D. RistiΔ‡; V. HolΓ½; M. Ivanda; M. MarciuΕ‘; M. Buljan; O. Gamulin; K. FuriΔ‡; M. R πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 685 KB

The silicon-rich oxide (SiO x ) films were deposited using the LPCVD (Low Pressure Chemical Vapour Deposition) method at the temperature of 570 Β°C and with silane and oxygen as the reactant gasses. The films were deposited on silicon (1 1 1) substrates. The flows of oxygen and silan in the horizonta