Multilayers of Ge nanocrystals embedded in Al2O3 matrix: Structural and electrical studies
β Scribed by S.R.C. Pinto; A.G. Rolo; A. Chahboun; Maja Buljan; A. Khodorov; R.J. Kashtiban; U. Bangert; N.P. Barradas; E. Alves; S. Bernstorff; M.J.M. Gomes
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 603 KB
- Volume
- 87
- Category
- Article
- ISSN
- 0167-9317
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β¦ Synopsis
In this paper, Ge/Al 2 O 3 multilayer systems were grown by pulsed laser ablation. The grown samples were annealed at 900 Β°C to promote the formation of Ge nanocrystals. Rutherford backscattering spectroscopy and transmission electron microscopy confirmed the presence of a multilayer system. Grazing incidence small angles X-ray scattering technique demonstrates the formation of Ge nanoclusters formed between alumina layers. Room temperature I-V measurements showed weak carrier trapping in the system. This was explained by the leakage caused by Ge diffusion through the multilayer.
π SIMILAR VOLUMES
Si nanocrystals (Si-ncs) embedded in SiO 2 /SiN x multilayer structures can be of interest for optoelectronic devices such as solar cells. However, controlling the size and density of the Si-ncs is strongly requested for an efficient use in a functioning solar cell device. In this work, SiO 2 and S