Multi-cathode unbalanced magnetron sputtering systems
โ Scribed by William D. Sproul
- Book ID
- 107930127
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 825 KB
- Volume
- 49
- Category
- Article
- ISSN
- 0257-8972
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
In conventional balanced-magnetron (CBM) sputtering, the amount of ion bombardment of the growing film, as measured by the substrate bias current density, is limited to less than 1 mA cm -z. Fast secondary electrons escaping from the target surface quickly find a path to ground and undergo few ioniz
A dc magnetron system for cathode sputtering with a spool-shaped cathode is described. In comparison with the cylindrical cathode, the spool-shaped cathode increases the intensity of the discharge by one order of magnitude for gas pressures of 10 -2 to IO -3 torr. The main characteristics of the sys
at 600ยฐC in 11.2 ~ Ag/Cu bimetallic thin films prepared by vapour deposition on mica. The technique consists in matching experimental intensity bands to those calculated from assumed concentration profiles. The profiles which gave best fit in the Ag-rich layer were analysed by means of a linear diff