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Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge

✍ Scribed by Yamamura, Y.


Book ID
121850774
Publisher
AVS (American Vacuum Society)
Year
1995
Tongue
English
Weight
617 KB
Volume
13
Category
Article
ISSN
0734-2101

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Monte Carlo simulation of argon atoms tr
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## RFpower and DC bias have been simultaneously applied to the target in a conventional magnetron sputtering system in order to control the growth kinetics of W thin films using argon gas for sputtering. A Monte Carlo simulation based on physical models of ion-plasma sputtering was carried out to st