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Monte Carlo simulation of a control for cathodic sputtering

โœ Scribed by Andreas Mohnke


Book ID
118767641
Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
498 KB
Volume
3
Category
Article
ISSN
0947-076X

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Investigation of ion beam sputtering pro
โœ Michio Mizutani; Kimihiro Sasaki; Tomonobu Hata ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 547 KB

A simulation of ion beam sputtering for Si and Ge is carried out and the simulation results are compared with the experimental ones. By analyzing each process, the validity of the simulation is investigated. The simulation results include the sputtering yield, energy distribution, ejected angle dist