✦ LIBER ✦

Monitoring trapped charge generation for gate oxide under stress [MOS capacitors]

✍ Scribed by Yung Hao Lin; Chung Len Lee; Tan Fu Lei

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Reduction of oxide charge and interface-

✍ Weijtens, C.H.L. 📂 Article 📅 1992 🏛 IEEE 🌐 English ⚖ 635 KB

Positive charge trapping in thin gate ox

✍ Samanta, Piyas ;Sarkar, C. K. 📂 Article 📅 1995 🏛 John Wiley and Sons 🌐 English ⚖ 570 KB

Charge trap generation in LPCVD oxides u

✍ Bhat, N.; Apte, P.P.; Saraswat, K.C. 📂 Article 📅 1996 🏛 IEEE 🌐 English ⚖ 712 KB

Correlation of stress-induced leakage cu

✍ Yung Hao Lin; Chung Len Lee; Tan Fu Lei 📂 Article 📅 1998 🏛 IEEE 🌐 English ⚖ 92 KB

A new method for fixed oxide charge dete

✍ Iniewski, K.; Salama, C.A.T. 📂 Article 📅 1991 🏛 IEEE 🌐 English ⚖ 333 KB

Effects of high field generation of char

✍ Ito, A. 📂 Article 📅 1993 🏛 IEEE 🌐 English ⚖ 369 KB