๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Molecular dynamics simulation of reactive ion etching of Si by energetic Cl ions

โœ Scribed by Hanson, D. E.; Voter, A. F.; Kress, J. D.


Book ID
126035063
Publisher
American Institute of Physics
Year
1997
Tongue
English
Weight
811 KB
Volume
82
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES