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Modeling of the Ostwald ripening of extrinsic defects and transient enhanced diffusion in silicon

✍ Scribed by A Claverie; B Colombeau; F Cristiano; A Altibelli; C Bonafos

Book ID: 114165199
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 123 KB
Volume: 186
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(01)00914-4

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