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Modeling of the interstitial diffusion of boron in crystalline silicon

✍ Scribed by O. I. Velichko, V. V. Aksenov, A. P. Kovaleva

Book ID: 118802231
Publisher: Springer US
Year: 2012
Tongue: English
Weight: 179 KB
Volume: 85
Category: Article
ISSN: 1573-871X
DOI: 10.1007/s10891-012-0731-9

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