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Modeling and characterization of atomically sharp “perfect” Ge/SiO2 interfaces

✍ Scribed by Wolfgang Windl; Tao Liang; Sergei Lopatin; Gerd Duscher


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
349 KB
Volume
114-115
Category
Article
ISSN
0921-5107

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