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Model for noncollisional heating in inductively coupled plasma processing sources

โœ Scribed by Rauf, Shahid; Kushner, Mark J.


Book ID
121343758
Publisher
American Institute of Physics
Year
1997
Tongue
English
Weight
535 KB
Volume
81
Category
Article
ISSN
0021-8979

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A large area (830 mm ร‚ 1020 mm) inductively coupled plasma source with a six internal straight antennas was developed for large area FPD (Flat Panel Display) etch process applications and the effects of magnetic fields employing permanent magnets on the plasma characteristics were investigated. Usin