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MOCVD of LaAlO3 Films from a Molten Precursor Mixture: Characterization of Liquid, Gas, and Deposited Phases

โœ Scribed by G. Malandrino; G.G. Condorelli; R. Lo Nigro


Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
344 KB
Volume
10
Category
Article
ISSN
0948-1907

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Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt 2 ) 3 , by Aerosol-Assisted CVD. -The novel liquid gallium monothiocarbamato complex (III) is utilized as a single-source precursor for the deposition of face-centered cubic GaS films on glass substra