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MOCVD growth of a-plane InN films on r-Al2O3 with different buffer layers

✍ Scribed by Biao Zhang; Huaping Song; Jun Wang; Caihong Jia; Jianming Liu; Xiaoqing Xu; Xianglin Liu; Shaoyan Yang; Qinsheng Zhu; Zhanguo Wang

No coin nor oath required. For personal study only.

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