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Microstructure and stress development in magnetron sputtered TiAlCr(N) films

✍ Scribed by Feng Huang; Guohua Wei; John A Barnard; Mark L Weaver

Book ID
108422957
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
444 KB
Volume
146-147
Category
Article
ISSN
0257-8972

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Mo(Cr) thin films were deposited by an Ionized Physical Vapor Deposition process i.e. Ionized Magnetron Sputtering (IMS). This deposition technique enables to ionize the neutral metallic sputtered species by a secondary plasma generated through a radio-frequency (RF: 13.56 MHz) powered coil. Thus, b