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Microstructural characterization of stoichiometric buried Si3N4 films

✍ Scribed by E.C. Paloura; A. Ginoudi; A. Markwitz; Ch. Lioutas; M. Katsikini; K. Bethge; S. Aminpirooz; H. Rossner; E. Holub-Krappe; T. Zorba; D. Siapkas

Book ID
113287382
Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
467 KB
Volume
113
Category
Article
ISSN
0168-583X

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