Microstructural Characterization of Electrosynthesized ZnTe Thin Films

✍ Scribed by T. Mahalingam; V.S. John; G. Ravi; P.J. Sebastian

• Publisher: John Wiley and Sons
• Year: 2002
• Tongue: English
• Weight: 294 KB
• Volume: 37
• Category: Article
• ISSN: 0232-1300
• DOI: 10.1002/1521-4079(200204)37:4<329::aid-crat329>3.0.co;2-u

✦ Synopsis

Thin films of zinc telluride (ZnTe) were electrosynthesized on tin oxide coated conducting glass substrates at various bath temperatures. The deposited films were characterized by x-ray diffraction (XRD) and scanning electron microscopy (SEM). The structure was found to be cubic with preferential orientation along (111) plane. X-ray line profile analysis technique by the method of the variance has been used to evaluate the microstructural parameters. The variation of different microstructural parameters such as, crystallite size, RMS strain, dislocation density and stacking fault probability affecting the fraction of planes with film thickness and bath temperatures were studied. The experimental observations are discussed in detail.