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Microstructural changes during annealing of FePd-based thin films

✍ Scribed by Huiping Xu; Helge Heinrich; Jörg M.K Wiezorek


Book ID
117681576
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
427 KB
Volume
11
Category
Article
ISSN
0966-9795

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Microstructural analysis and electrical
✍ Al-Mohammad, Ahmad 📂 Article 📅 2008 🏛 John Wiley and Sons 🌐 English ⚖ 688 KB

## Abstract WO~3~ thin films have been deposited by thermal evaporation on (0001) surfaces of α‐Al~2~O~3~ single crystal and annealed between 423 K and 623 K in air with a mean humidity of 50%. The structural and morphological properties of the films have been characterized by transmission electron