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Microstructural analysis and electrical conductivity of hexagonal WO3thin films during annealing

✍ Scribed by Al-Mohammad, Ahmad


Book ID
105364479
Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
688 KB
Volume
205
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

WO~3~ thin films have been deposited by thermal evaporation on (0001) surfaces of α‐Al~2~O~3~ single crystal and annealed between 423 K and 623 K in air with a mean humidity of 50%. The structural and morphological properties of the films have been characterized by transmission electron microscopy and compatible selected area electron diffraction. During annealing, important changes in grain size and structure occur. As the annealing temperature increases slightly, the WO~3~Β·1/3H~2~O structure successively transforms to hexagonal WO~3~ and Magneli WO~3–x~ phases. During these structural transformations, the grains are constructed of twinned microdomains in different directions with largest lattice parameters of WO~3~. The conductivity of the WO~3~ thin films has been investigated as a function of annealing temperature for each stable crystallographic phase. The activation energy for conduction deduced from the Arrhenius equation is found to be dependent on surface structure during various WO~3~ phases. (Β© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)


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