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Microstructural and electrochromic properties of sputter-deposited Ni oxide films grown at different working pressures

✍ Scribed by Ahn, Kwang-Soon; Nah, Yoon-Chae; Sung, Yung-Eun


Book ID
120517975
Publisher
American Institute of Physics
Year
2002
Tongue
English
Weight
562 KB
Volume
92
Category
Article
ISSN
0021-8979

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The nanocrystal thin films of zinc oxide doped by Al (ZnO:Al) were deposited by dc reactive magnetron sputtering on the glass substrates, in the pressure range of 33-51 Pa. From the X-ray diffraction patterns, the nanocrystalline structure of ZnO:Al films and the grain size were determined. The opti