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Micromachined high-Q inductors in a 0.18-μm copper interconnect low-k dielectric CMOS process

✍ Scribed by Lakdawala, H.; Zhu, X.; Luo, H.; Santhanam, S.; Carley, L.R.; Fedder, G.K.

Book ID
119776037
Publisher
IEEE
Year
2002
Tongue
English
Weight
276 KB
Volume
37
Category
Article
ISSN
0018-9200

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