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A 0.11 μm CMOS technology featuring copper and very low k interconnects with high performance and reliability

✍ Scribed by Yoshihiro Takao; Hiroshi Kudo; Junichi Mitani; Yoshiyuki Kotani; Satoshi Yamaguchi; Keizaburo Yoshie; Kazuo Sukegawa; Nobuhisa Naori; Satoru Asai; Michiari Kawano; Takashi Nagano; Ikuhiro Yamamura; Masaya Uematsu; Naoki Nagashima; Shingo Kadomura

Book ID: 108361882
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 929 KB
Volume: 42
Category: Article
ISSN: 0026-2714
DOI: 10.1016/s0026-2714(01)00233-5

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