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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering

✍ Scribed by Chi-Tung Huang; Jenq-Gong Duh


Book ID
110372507
Publisher
Springer
Year
1997
Tongue
English
Weight
48 KB
Volume
16
Category
Article
ISSN
0261-8028

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