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Nanocomposite Ti–Si–N films deposited by reactive unbalanced magnetron sputtering at room temperature

✍ Scribed by Ning Jiang; Y.G Shen; Y.-W Mai; Tai Chan; Simon C Tung

Publisher: Elsevier Science
Year: 2004
Tongue: English
Weight: 356 KB
Volume: 106
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2003.09.033

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A correlation between the film properties of nitrides, oxides etc., and their structure, is of fundamental importance – not only for thin solid films physics but also for practical applications. The structure of the films depends on deposition methods and their parameters. The relationship between p