Metalorganic chemical vapor deposition of metal oxide films exhibiting electric-pulse-induced resistance switching

✍ Scribed by Toshihiro Nakamura; Kohei Homma; Takashi Yakushiji; Ryusuke Tai; Akira Nishio; Kunihide Tachibana

• Book ID: 104093974
• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 449 KB
• Volume: 201
• Category: Article
• ISSN: 0257-8972
• DOI: 10.1016/j.surfcoat.2007.04.090

✦ Synopsis

Pr 1-x Ca x MnO 3 (PCMO) films with the desired atomic composition were deposited on Pt/SiO 2 /Si substrates by metalorganic chemical vapor deposition (MOCVD) using in situ infrared spectroscopic monitoring. The I-V characteristics exhibited nonlinear, asymmetric, and hysteretic behavior in PCMO-based devices with top electrode of Al or Ti. The electric-pulse-induced resistance switching was observed in the PCMO-based devices. The resistance change was dependent on the Pr/Ca composition ratio of the PCMO films and the kind of the top electrodes.