Metalorganic chemical vapor deposition o
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Toshihiro Nakamura; Kohei Homma; Takashi Yakushiji; Ryusuke Tai; Akira Nishio; K
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Article
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2007
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Elsevier Science
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English
โ 449 KB
Pr 1-x Ca x MnO 3 (PCMO) films with the desired atomic composition were deposited on Pt/SiO 2 /Si substrates by metalorganic chemical vapor deposition (MOCVD) using in situ infrared spectroscopic monitoring. The I-V characteristics exhibited nonlinear, asymmetric, and hysteretic behavior in PCMO-bas