Metal organic chemical vapor deposition (MOCVD) of oxides and ferroelectric materials
โ Scribed by P. J. Wright; M. J. Crosbie; P. A. Lane; D. J. Williams; A. C. Jones; T. J. Leedham; H. O. Davies
- Book ID
- 110397657
- Publisher
- Springer US
- Year
- 2002
- Tongue
- English
- Weight
- 501 KB
- Volume
- 13
- Category
- Article
- ISSN
- 0957-4522
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es
## Abstract Lanthanum nickelate layers have been deposited onto 100โmm diameter silicon/silicon dioxide and (0001) sapphire substrates by liquidโdelivery metalโorganic (MO) CVD using the precursors La(thd)~3~ and Ni(thd)~2~ (thdโ=โ2,2,6,6โtetramethylโ3,5โheptanedionato) dissolved in tetrahydrofuran