๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Metallo-Organic Chemical Vapor Deposition (MOCVD) for the Development of Heterogeneous Catalysts

โœ Scribed by Chu, Hiu Ping; Lei, Lecheng; Hu, Xijun; Yue, Po-Lock


Book ID
120364255
Publisher
American Chemical Society
Year
1998
Tongue
English
Weight
218 KB
Volume
12
Category
Article
ISSN
0887-0624

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Handbook of Chemical Vapor Deposition (C
โœ Pierson, Hugh O. ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier ๐ŸŒ English โš– 83 KB

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now es