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Metal-containing amorphous carbon film development using electron cyclotron resonance CVD

✍ Scribed by Rusli, H.; Yoon, S.F.; Huang, Q.F.; Ahn, J.; Zhang, Q.; Yang, H.; Wu, Y.S.; Teo, E.J.; Osipowicz, T.; Watt, F.


Book ID
124108211
Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
164 KB
Volume
10
Category
Article
ISSN
0925-9635

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Amorphous carbon film deposition using a
✍ SF Yoon; Ruslie; J Ahn; Q Zhang; YS Wu; H Yang πŸ“‚ Article πŸ“… 1998 πŸ› Elsevier Science 🌐 English βš– 330 KB

The deposition of hydrogenated amorphous carbon (a-C:H) films from a mixture of hydrogen and methane using the electron cyclotron resonance chemical vapour deposition (ECR-CVD) method is reported. A screen grid positioned above the substrate was used to provide an electric field to accelerate the io