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Mechanism of ion-assisted etching of silicon by fluorine atoms

✍ Scribed by J.A. Yarmoff; F.R. McFeely

Book ID: 104195420
Publisher: Elsevier Science
Year: 1987
Weight: 44 KB
Volume: 184
Category: Article
ISSN: 0167-2584
DOI: 10.1016/0167-2584(87)90353-7

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