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A SIMS study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment

โœ Scribed by E.-A. Knabbe; J.W. Coburn; E. Kay


Book ID
118984409
Publisher
Elsevier Science
Year
1982
Tongue
English
Weight
842 KB
Volume
123
Category
Article
ISSN
0039-6028

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