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Mechanism of chemical vapor deposition of silicon

โœ Scribed by J. Nishizawa; M. Saito


Publisher
Elsevier Science
Year
1981
Tongue
English
Weight
351 KB
Volume
52
Category
Article
ISSN
0022-0248

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Modeling of flame assisted chemical vapo
โœ M. Masi; C. Cavallotti; E. Raffa ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 327 KB ๐Ÿ‘ 1 views

## Abstract The simulation of a flame assisted chemical vapor deposition (FACVD) process is here proposed with reference to the growth of silicon thin films through the silane/chlorosilanes/hydrogen/chlorine route. The goal is to design a reactor able to deposit micromorphous or multicrystalline fi