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Mechanical stability of Si thin film deposited on a Ti–50.3Ni(at%) alloy

✍ Scribed by Bo-min Kim; Gyu-bong Cho; Jung-pil Noh; Hyo-jun Ahn; Eun-soo Choi; Shuichi Miyazaki; Tae-hyun Nam

No coin nor oath required. For personal study only.

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