Mechanical properties of the plasma-enhanced magnetron sputtering Si–C–N coatings
✍ Scribed by Yanfeng Wang; Zhengxian Li; Jihong Du; Baoyun Wang
- Book ID
- 103820282
- Publisher
- Elsevier Science
- Year
- 2010
- Tongue
- English
- Weight
- 441 KB
- Volume
- 257
- Category
- Article
- ISSN
- 0169-4332
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📜 SIMILAR VOLUMES
Motivated by the success of transition metal nanocomposite hard coatings, a new optically transparent coating based on the Al-Si-N ternary system was developed. Al-Si-N thin films were deposited by reactive DC magnetron co-sputtering of Al and Si targets in an Ar/N 2 atmosphere at 200 °C and 500 °C
Cr-Si-N thin films were deposited by pulsed DC reactive dual-magnetron sputtering using Cr and Si targets, while various currents applied to the Si target allowed one to vary the Si content (C Si ) in the films. Microstructure, composition and mechanical properties were studied as a function of C Si