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Maximum concentration of implanted projectiles during ion sputtering

✍ Scribed by Yu Kudriavtsev

Book ID: 114171651
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 83 KB
Volume: 160
Category: Article
ISSN: 0168-583X
DOI: 10.1016/s0168-583x(99)00615-1

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