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Mathematical model for controlling nonuniformity in reactive ion etching

✍ Scribed by G. A. Chechko; I. V. Medvedev; N. I. Khodakovskii; V. N. Sklepovoi

Publisher: Springer US
Year: 1994
Tongue: English
Weight: 166 KB
Volume: 71
Category: Article
ISSN: 1573-8795
DOI: 10.1007/bf02111958

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