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Materials modifications using a multi-ion beam processing and lithography system

✍ Scribed by Bill R. Appleton; S. Tongay; M. Lemaitre; Brent Gila; Joel Fridmann; Paul Mazarov; Jason E. Sanabia; S. Bauerdick; Lars Bruchhaus; Ryo Mimura; Ralf Jede

Book ID
113823337
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
914 KB
Volume
272
Category
Article
ISSN
0168-583X

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Chemical modification and patterning of
Chemical modification and patterning of self assembled monolayers using scanning electron and ion-beam lithography
✍ Maria JesΓΊs PΓ©rez RoldΓ‘n; CΓ©sar Pascual GarcΓ­a; Gerardo Marchesini; Douglas Gill πŸ“‚ Article πŸ“… 2011 πŸ› Elsevier Science 🌐 English βš– 543 KB

We present chemical modification of self assembled monolayers (SAMs) using electron and ion-beam lithographies. We used thiolated polyethylene oxide (PEO) SAMs on gold to fabricate chemically contrasting patterns at the nanoscale. Patterned surfaces were characterized by X-ray photoelectron spectros