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Nanofabrication on InP using focused ion beam lithography and Cl2 etching: process and control

✍ Scribed by C.H. Chu; Y.L. Wang; Y.F. Hsieh; L.R. Harriott; H.H. Wade; H. Temkin; R.A. Hamm

Book ID: 113300240
Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 903 KB
Volume: 33
Category: Article
ISSN: 0254-0584
DOI: 10.1016/0254-0584(93)90108-x

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