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Investigating carbon materials for use as the electron emission source in a parallel electron-beam lithography system

✍ Scribed by W.I Milne; K.B.K Teo; M Chhowalla; G.A.J Amaratunga; J Yuan; J Robertson; P Legagneux; G Pirio; Karim Bouzehouane; D Pribat; W Bruenger; C Trautmann


Publisher
Elsevier Science
Year
2001
Tongue
English
Weight
594 KB
Volume
1
Category
Article
ISSN
1567-1739

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