๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Mass spectrometry detection of radicals in SiH 4 -CH 4 -H 2 glow discharge plasmas

โœ Scribed by Kae-Nune, P; Perrin, J; Guillon, J; Jolly, J

Book ID
120481424
Publisher
Institute of Physics
Year
1995
Tongue
English
Weight
618 KB
Volume
4
Category
Article
ISSN
0963-0252

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Detection of CH3 radicals in an RF CH4H2
Detection of CH3 radicals in an RF CH4H2 plasma by photoionization mass spectrometry
โœ S Ando; M Shinohara; K Takayama ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 845 KB

To investigate processes occurring during thin-film deposition by plasma chemical vapor deposition, a study was made of the radical species in an RF CHdH\* plasma using photoionization mass spectrometry. The method avoids fragmentation of particles as can occur in conventional mass spectrometry by u

Characterization of undoped ฮผc-SiO:H fil
Characterization of undoped ฮผc-SiO:H films prepared from (SiH4 + CO2 + H2)-plasma in RF glow discharge
๐Ÿ“‚ Article ๐Ÿ“… 2001 ๐Ÿ› Elsevier Science โš– 196 KB

investieations on solar thermal collectors and solar systems within the precedyng IEA Task X (1985)(1986)(1987)(1988)(1989)(1990)(1991) as well as further studies in this field by the group itself formed a basis for this work. The procedure was formulated as g standard, and submitted to IS0 at the b