๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Investigations of CH 4 , C 2 H 2 and C 2 H 4 dusty RF plasmas by means of FTIR absorption spectroscopy and mass spectrometry

โœ Scribed by Deschenaux, Ch; Affolter, A; Magni, D; Hollenstein, Ch; Fayet, P


Book ID
120656654
Publisher
Institute of Physics
Year
1999
Tongue
English
Weight
313 KB
Volume
32
Category
Article
ISSN
0022-3727

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Detection of CH3 radicals in an RF CH4H2
โœ S Ando; M Shinohara; K Takayama ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 845 KB

To investigate processes occurring during thin-film deposition by plasma chemical vapor deposition, a study was made of the radical species in an RF CHdH\* plasma using photoionization mass spectrometry. The method avoids fragmentation of particles as can occur in conventional mass spectrometry by u