Plasma Composition by Mass Spectrometry in a Ar-SiH4-H2LEPECVD Process During nc-Si Deposition

✍ Scribed by T. Moiseev; D. Chrastina; G. Isella

• Book ID: 106491079
• Publisher: Springer
• Year: 2011
• Tongue: English
• Weight: 922 KB
• Volume: 31
• Category: Article
• ISSN: 0272-4324
• DOI: 10.1007/s11090-010-9277-9