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Mass density control of carbon films deposited by H-assisted plasma CVD method

โœ Scribed by Urakawa, Tatsuya; Matsuzaki, Hidehumi; Yamashita, Daisuke; Uchida, Giichiro; Koga, Kazunori; Shiratani, Masaharu; Setsuhara, Yuichi; Sekine, Makoto; Hori, Masaru

Book ID
122023491
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
735 KB
Volume
228
Category
Article
ISSN
0257-8972

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Electronic properties of ion irradiated
Electronic properties of ion irradiated amorphous carbon films prepared by plasma assisted CVD method
โœ S Bhattacharyya; D Kanjilal; A Sayeed; V Meenakshi; SV Subramanyam ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 425 KB

## Amorphous hydrogenated carbon films were prepared by plasma assisted CVD method. Their de conductivity was studied as a function of temperature in the range of 300 K to 10 K. films were then subjected to high energy (170 MeVI ion irradiation. After irradiation a marked change was observed in th