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Maskless electron beam lithography: prospects, progress, and challenges

✍ Scribed by T.R. Groves; D. Pickard; B. Rafferty; N. Crosland; D. Adam; G. Schubert

Book ID: 114155453
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 344 KB
Volume: 61-62
Category: Article
ISSN: 0167-9317
DOI: 10.1016/s0167-9317(02)00528-2

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