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Marks for SCALPEL® tool optics optimization

✍ Scribed by R.C. Farrow; G.M. Gallatin; W.K. Waskiewicz; J.A. Liddle; I. Kizilyalli; A. Kornblit; C. Biddick; M. Blakey; F. Klemens; J. Felker; J. Kraus; M. Mkrtchyan; P.A. Orphanos; N. Layadi; S. Merchant

Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
289 KB
Volume
53
Category
Article
ISSN
0167-9317

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✦ Synopsis

A method for optimizing the electron optics of the SCALPEL exposure tool is described. The method uses the SCALPEL mark detection method with a grating mark as an aerial image monitor. The root-mean-square deviation of the recorded backscattered electron signal from an ideal triangle waveform was used as a measure of the image fidelity, scale and orientation. The resolution of the technique is limited only by signal-to-noise and the fidelity of the marks. Experiments were performed using 2 lam period grating marks that were fabricated in a SiO2/WSi2 structure using SCALPEL lithography and plasma processing. The projector lenses and magnification/rotation coils were optimized. For these experiments the measured resolutions for determining focus (81), magnification (SM), and rotation (80) of a 250 lam X 250 tam field were 8f ~ _+1 lam, 8M -_+15 ppm and 80 -_+ 0.1 mrad. A straightforward path to improving these results is described.

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