CMOS compatible alignment marks for the SCALPEL proof of lithography tool

✍ Scribed by R.C. Farrow; W.K. Waskiewicz; I. Kizilyalli; L. Ocola; J. Felker; C. Biddick; G. Gallatin; M. Mkrtchyan; M. Blakey; J. Kraus; A. Novembre; P. Orphanos; M. Peabody; R. Kasica; A. Kornblit; F. Klemens

• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 562 KB
• Volume: 46
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/s0167-9317(99)00077-5