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Manipulation of two-dimensional arrays of Si nanocrystals embedded in thin SiO[sub 2] layers by low energy ion implantation

✍ Scribed by Bonafos, C.


Book ID
125452071
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
825 KB
Volume
95
Category
Article
ISSN
0021-8979

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## Abstract We propose an original approach called β€œstencil‐masked ion implantation process” to perform a spatially localized synthesis of a limited number of Si nanoparticles (nps) within a thin SiO~2~ layer. This process consists in implanting silicon ions at ultra‐low energy through a stencil ma