Magnetoresistance of 3d transition-metal-doped epitaxial ZnO thin films
β Scribed by Zhengwu Jin; K Hasegawa; T Fukumura; Y.Z Yoo; T Hasegawa; H Koinuma; M Kawasaki
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 100 KB
- Volume
- 10
- Category
- Article
- ISSN
- 1386-9477
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β¦ Synopsis
Epitaxial ZnO thin ΓΏlms co-doped with 3d transition metal (TM) (TM = Cr, Mn, Fe, Co, Ni and Cu) and 1 mol% Al were fabricated as a series of oxide-diluted magnetic semiconductors by pulsed-laser-deposition method. Magnetoresistance (MR) of the ΓΏlms was measured to investigate the s-d exchange interaction between the conducting s electron spins and the d electron spins localized at the magnetic TM impurities. A variety of MR behaviors were observed depending on the di erent TM impurities. It is deduced that the negative MR behavior in the vicinity of zero ΓΏeld is originated from an electron weak-localization e ect. Caused by the s-d exchange interaction, the increase of Thomas-Fermi radius Rs and the decrease of spin-disorder scattering with increasingly aligned spins of the TM ion impurities are responsible respectively for the positive and negative MR in the higher magnetic ΓΏled.
π SIMILAR VOLUMES
Arsenic doped p-type ZnO thin films were grown on sapphire substrate by magnetron sputtering. As grown films reveal p-type conduction confirmed by Hall-effect and photoluminescence measurements. The p-type film with a hole concentration of 2.16Γ 10 17 cm -3 , mobility of 1.30 cm 2 /V.s and resistivi