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Magnetic properties of Co–N thin films deposited by reactive sputtering

✍ Scribed by Silva, C.; Vovk, A.; da Silva, R.C.; Strichovanec, P.; Algarabel, P.A.; Gonçalves, A.P.; Borges, R.P.; Godinho, M.; Cruz, M.M.

Book ID
122206404
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
458 KB
Volume
556
Category
Article
ISSN
0040-6090

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Nickel oxide (NiO) thin films were deposited by dc reactive magnetron sputtering Ni in an Ar+O, mixed atmosphere at room temperature on unheated Si substrates. The oxygen content in the gas was varied from 10 to 50% and its effect on the deposition rate, structural, composition and electrical proper