๐”– Bobbio Scriptorium
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Low-temperature metal-organic chemical vapor deposition (LTMOCVD) of device-quality copper films for microelectronic applications

โœ Scribed by Alain E. Kaloyeros; Aiguo Feng; Jonathan Garhart; Kenneth C. Brooks; Sumanta K. Ghosh; Arjun N. Saxena; Fred Luehrs

Book ID
112839327
Publisher
Springer US
Year
1990
Tongue
English
Weight
806 KB
Volume
19
Category
Article
ISSN
0361-5235

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โœ W.R. Burger; R. Reif ๐Ÿ“‚ Article ๐Ÿ“… 1988 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 316 KB

A system has been developed that permits the deposition of device quality epitaxial silicon films at low temperatures. Using this system, epitaxial layers" have been grown that have a minoritycarrier lifetime of about 0.5 ms; the highest vahw reported for any low temperature silicon epitaxial proces