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Low temperature growth of nanoblade In2O3 thin films by plasma enhanced chemical vapor deposition: Morphology control and lithium storage properties

โœ Scribed by Jie Zheng; Rong Yang; Yu Lou; Wei Li; Xingguo Li


Book ID
118501877
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
613 KB
Volume
521
Category
Article
ISSN
0040-6090

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A temperature-controlled chemical vapor deposition (TC-CVD) process was developed for in-situ growth of highly c-axis orientated YtBa2Cu30~+x (YBCO) thin films directly on sapphire substrates. This new CVD process, for the first time, uses programmable temperature controllers to optimize and tailor